Configure | Spec |
Processing room and vacuum exhaust system | Chamber Sharp | φ260mm Spherical SUS |
Reaching vacuum | Less than6.7×10-7Pa (5×10-9Torr) |
Ceramic bearing turbo pump | 250L/s |
Target revolution unit | φ20mm×6 axes Rotation / revolution motor drive (PC control) |
Substrate heating unit | Infrared lamp substrate heating unit (can be changed to semiconductor laser substrate heating unit) |
Size of substrate | 10mm |
Maximum heating temperature | Above 800℃ |
Common specification | Power supply / control rack (JIS standard compliant) integrated chamber frame PLD automatic control system (PC and control software) |